With the industry’s cutting-edge ion implantation (IMP) and atomic layer deposition (ALD) technology, Sirei Intelligence debuted at SEMICON China 2024, and continues to build the world’s first-class high-end semiconductor manufacturing equipment, enabling a wide range of advanced fields such as integrated circuits and third-generation semiconductors.

DMP10.24 China has shown strong demand and consumption power for mature node technology.

Throughout the whole world, ion implantation has become the most important doping method in semiconductor device preparation, is one of the most basic preparation processes. From 2000 to 2023, China’s IC wafer manufacturing capacity has increased from 2% to 20% of the world, and China’s production capacity will continue to meet the rapid growth period in the future, with an average annual growth rate of more than 10%. The innovation of the new generation DMP10.24 of integrated circuit manufacturing technology continues to advance, and the market application prospects of domestic ion implanters are rapidly expanding, which is also the track of Sirui’s key investment layout.

Integrated circuit manufacturing is flourishing, and IMP localization is promising

DMP10.24

At the same IC manufacturing industry chain International Forum, Chen Xianglong, deputy general manager of Sirui Intelligence, said: “Ion implantation equipment is empowering a new generation of logic, storage, image sensors, power semiconductors and other popular applications can use ion implantation machines to improve device performance or production capacity. Emerging applications are driving innovation in ion implantation technology. In the consumer market, for example, smartphones are increasingly demanding camera pixels, and image sensors (CIS) need to prepare deep photodiodes with higher depth-to-aspect ratios. At this time, the energy of ion implantation will reach 8MeV, the highest and even more than 10MeV, and the high-energy ion implantation machine will become an irreplaceable choice. At the same time, the development of advanced manufacturing processes has further promoted the application of low-energy large-beam machines. Sirui intelligent layout of “high energy ion implantation machine + large beam ion implantation machine” series of product portfolio to meet more application challenges.”

Since 2021, Sirui Intelligence has set up a core technical team, started the research and development of ion implantation equipment, and made technological breakthroughs in 2023 for the first high-energy ion implantation machine and won orders from domestic DMP10.24 customers, and continuously improved the business layout simultaneously. Sirui intelligent high energy ion implanter has the advantages of high RF transmission efficiency and high energy resolution, and its key characteristics include the RF segment transmission efficiency of 30%-50%. The energy resolution is as high as ±1%, which is less than the level of ±2.5% in the industry, etc., and the technology is leading in the localization of key equipment.

Entering 2024, industries such as AI and the new intelligent applications it drives, AI PC and AI mobile phones, new energy vehicles and industrial applications are facing new opportunities and challenges. Integrated circuits are the core of AI technology development, and equipment is the cornerstone of integrated circuit chip technology innovation. Sirui Intelligent is willing to work with partners to enable the high-quality development of the semiconductor industry chain and promote the innovation and progress of industry technology.