0190-37519 RF Match Network Unit

Key Features and Advantages

The Applied Materials 0190-37519 RF match network unit delivers precision impedance matching for semiconductor plasma processes with its ultra-fast 1.5 μs response time. Engineered for advanced CVD and etch applications, it maintains VSWR <1.5:1 at full 5000W RF power, ensuring maximum power transfer to plasma while minimizing reflected energy. The unit’s automatic tuning capability compensates for dynamic plasma impedance changes during process transitions.

Advanced diagnostics: Real-time monitoring of forward/reflected power with ±1% accuracy enables precise process control. The 0190-37519 features integrated self-calibration and continuous health monitoring, detecting component degradation before it impacts process stability. Its SECS/GEM interface provides comprehensive data logging for process analysis and predictive maintenance.

0190-37519

Robust industrial design: Built to SEMI standards, the unit operates reliably in cleanroom environments with filtered forced-air cooling. Compliance with SEMI F47-0706 ensures uninterrupted operation during voltage sag events. The 0190-37519 features front-panel status indicators and remote monitoring via Ethernet/IP.

Safety features: Arc detection circuitry instantly shuts down power during plasma instability events. The 0190-37519 includes over-temperature protection and interlock circuits to prevent operation during unsafe conditions. Its compact 2U rack design saves valuable fab space while maintaining full functionality.

Integration capabilities: Compatible with AMAT’s proprietary RF generators, the 0190-37519 supports automatic configuration through equipment control systems. The unit stores multiple tuning profiles for quick process changeovers and features hot-swappable components to minimize tool downtime during maintenance.