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Lam Research challenges assumptions and breaks conventions. As technology becomes more sophisticated, we need to think big, constantly push the semiconductor industry to push boundaries, and develop solutions that enable chipmakers to keep advancing. Semiconductor manufacturing is a series of highly complex overlapping processes. Our customers face enormous technical challenges and need to focus on innovative technologies at the atomic level of miniaturization to produce components with smaller sizes, higher stacking levels and greater efficiency. Lam Research offers industry-leading process technologies such as Dry Resist, Selective Etch and Atomic Layer Deposition (ALD) to assist our customers with their challenges. As leading chip manufacturers move EUV microshadow systems into mass production, further improvements in productivity and resolution are necessary to microscale to future process nodes in a more cost-effective manner. Lam Research’s dry photoresist and development technology provides unique capabilities that allow chip manufacturers to vary the photoresist thickness simply by changing deposition and development times. Increased productivity and increased exposure process space by achieving lower doses and higher resolution.